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Al₂O₃ coatings on stainless steel using pulsed-pressure MOCVDKRUMDIECK, S; DAVIES, S; BISHOP, C. M et al.Surface & coatings technology. 2013, Vol 230, pp 208-212, issn 0257-8972, 5 p.Conference Paper

High-performance tandem silicon solar cells on F:SnO₂YATES, H. M; EVANS, P; SHEEL, D. W et al.Surface & coatings technology. 2013, Vol 230, pp 228-233, issn 0257-8972, 6 p.Conference Paper

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Photoassisted H₂ production by metal oxide nanomaterials fabricated through CVD-based approachesMACCATO, Chiara; BARRECA, Davide; CARRARO, Giorgio et al.Surface & coatings technology. 2013, Vol 230, pp 219-227, issn 0257-8972, 9 p.Conference Paper

Al-oxynitrides as a buffer layer for Pr₂O₃/SiC interfacesSOHAL, Rakesh; TORCHE, Mohamed; HENKEL, Karsten et al.Materials science in semiconductor processing. 2006, Vol 9, Num 6, pp 945-948, issn 1369-8001, 4 p.Conference Paper

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Hafnium and silicon carbide multilayer coatings for the protection of carbon compositesVERDON, C; SZWEDEK, O; JACQUES, S et al.Surface & coatings technology. 2013, Vol 230, pp 124-129, issn 0257-8972, 6 p.Conference Paper

Monitoring the microstructure of nanosized palladium layers obtained via thermal and VUV stimulated MOCVDKUCHUMOV, B. M; KORETSKAYA, T. P; IGUMENOV, I. K et al.Surface & coatings technology. 2013, Vol 230, pp 266-272, issn 0257-8972, 7 p.Conference Paper

Piezoelectric domains in BiFeO₃ films grown via MOCVD: Structure/ property relationshipCONDORELLI, Guglielmo G; CATALANO, Maria R; SMECCA, Emanuele et al.Surface & coatings technology. 2013, Vol 230, pp 168-173, issn 0257-8972, 6 p.Conference Paper

Precursor adsorption efficiency of titanium tetra isopropoxide in the presence of a barium β-diketonate precursorREINKE, Michael; KUZMINYKH, Yury; MALANDRINO, Graziella et al.Surface & coatings technology. 2013, Vol 230, pp 297-304, issn 0257-8972, 8 p.Conference Paper

Scale-up design for industrial development of a PP-MOCVD coating systemLEE, Darryl; KRUMDIECK, Susan; TALWAR, Sam Davies et al.Surface & coatings technology. 2013, Vol 230, pp 39-45, issn 0257-8972, 7 p.Conference Paper

Synthesis of BI₂O₃/SiO₂ core―shell nanoparticles by an atmospheric CVS/CVD process and their modification by hydrogen or electron-beam induced reductionWEIS, Frederik; SCHNEIDER, Reinhard; SEIPENBUSCH, Martin et al.Surface & coatings technology. 2013, Vol 230, pp 93-100, issn 0257-8972, 8 p.Conference Paper

Spatiotemporal patterns of external noise-induced transitions in a bistable reaction-diffusion system : Photoelectron emission microscopy experiments and modelingWEHNER, Stefan; HOFFMANN, Patrick; SCHMEISSER, Dieter et al.Physical review letters. 2005, Vol 95, Num 3, pp 038301.1-038301.4, issn 0031-9007Article

Diamond coatings on hardmetal substrates with CVD coatings as intermediate layersLESSIAK, Mario; HAUBNER, Roland.Surface & coatings technology. 2013, Vol 230, pp 119-123, issn 0257-8972, 5 p.Conference Paper

Effect of AC electric fields on the aerosol assisted chemical vapour deposition growth of titanium dioxide thin filmsROMERO, Luz; BINIONS, Russell.Surface & coatings technology. 2013, Vol 230, pp 196-201, issn 0257-8972, 6 p.Conference Paper

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High temperature chemical vapor deposition of aluminum nitride, growth and evaluationPONS, M; BOICHOT, R; COUDURIER, N et al.Surface & coatings technology. 2013, Vol 230, pp 111-118, issn 0257-8972, 8 p.Conference Paper

Influence of precursor nature on the thermal growth of Tin―Indium oxide layers by MOCVDSZKUTNIK, P. D; RAPENNE, L; ROUSSEL, H et al.Surface & coatings technology. 2013, Vol 230, pp 305-311, issn 0257-8972, 7 p.Conference Paper

The deposition of copper-based thin films via atmospheric pressure plasma-enhanced CVDHODGKINSON, John L; MASSEY, David; SHEEL, David W et al.Surface & coatings technology. 2013, Vol 230, pp 260-265, issn 0257-8972, 6 p.Conference Paper

Vapor-deposited hydrogenated and oxygen-deficient molybdenum oxide thin films for application in organic optoelectronicsVASILOPOULOU, Maria; KOSTIS, Ioannis; DOUVAS, Antonios M et al.Surface & coatings technology. 2013, Vol 230, pp 202-207, issn 0257-8972, 6 p.Conference Paper

Complete Time-Domain Diode Modeling: Application to Off-Chip and On-Chip Protection DevicesM'HAMED, Bruno Ben; TORRES, François; REINEIX, Alain et al.IEEE transactions on electromagnetic compatibility. 2011, Vol 53, Num 2, pp 349-365, issn 0018-9375, 17 p.Article

Extremely potent, rapid and costimulation-independent cytotoxic T-cell response against lymphoma cells catalyzed by a single-chain bispecific antibodyDREIER, Torsten; LORENCZEWSKI, Grit; BRANDL, Christian et al.International journal of cancer. 2002, Vol 100, Num 6, pp 690-697, issn 0020-7136Article

Advances in atmospheric pressure PECVD: The influence of plasma parameters on film morphologyHODGKINSON, J. L; SHEEL, D. W.Surface & coatings technology. 2013, Vol 230, pp 73-76, issn 0257-8972, 4 p.Conference Paper